Handbook of Thin-film Deposition Processes and Techniques
Author : Krishna Seshan
Publisher :
Total Pages : 629
Release : 2002
ISBN 10 : 6612253193
ISBN 13 : 9786612253195
Language : EN, FR, DE, ES & NL

Handbook of Thin-film Deposition Processes and Techniques Book Description:

The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.


Handbook of Thin-film Deposition Processes and Techniques
Language: en
Pages: 629
Authors: Krishna Seshan
Categories: Chemical vapor deposition
Type: BOOK - Published: 2002 - Publisher:

The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology exp
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Pages: 72
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The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular
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Type: BOOK - Published: 2002-02-01 - Publisher: CRC Press

The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular
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