Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies
Author : Y. Pauleau
Publisher : Springer Science & Business Media
Total Pages : 363
Release : 2012-12-06
ISBN 10 : 9789401003537
ISBN 13 : 940100353X
Language : EN, FR, DE, ES & NL

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies Book Description:

An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.


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